HOLE TRANSPORT AND TRAPPING IN FIELD OXIDES.

IEEE Transactions on Nuclear Science

Volumn NS-32, Issue 6, 1985, Pages

  Boesch Jr , H Edwin ^a   McLean, F Barry ^a  

^a US Army Research Development and Engineering Command   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; SILICA;

HOLE TRAPPING; MOSFETS; OXIDE LAYERS;

TRANSISTORS, FIELD EFFECT;

EID: 0022205830     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (14)