ELECTRON IRRADIATION OF POLYMERISABLE LANGMUIR-BLODGETT MULTILAYERS AS MODEL RESISTS FOR ELECTRON-BEAM LITHOGRAPHY.

British Polymer Journal

Volumn 17, Issue 4, 1985, Pages 360-363

  Boothroyd, Brian ^a   Delaney, Paul A ^a   Hann, Richard A ^a   Johnstone, Robert A W ^a   Ledwith, Anthony ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; PHOTORESISTS; POLYMERS - RADIATION EFFECTS;

LANGMUIR-BLODGETT MULTILAYERS; MODEL RESISTS; OXIRAN; POLYMERIZABLE AMPHIPHILES;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0022205146     PISSN: 00071641     EISSN: None     Source Type: Journal    
DOI: 10.1002/pi.4980170408     Document Type: Article

References (8)