NEW ISOLATION TECHNOLOGY FOR VLSI.

Conference on Solid State Devices and Materials

Volumn , Issue , 1985, Pages 337-340

  Nojiri, K ^a   Tsunokuni, K ^a   Hirobe, K ^a   Koike, A ^a   Ito, K ^a   Kishino, S ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; INTEGRATED CIRCUITS - MASKS; SEMICONDUCTING SILICON COMPOUNDS - APPLICATIONS;

ISOLATION TECHNOLOGY; SELECTIVE OXIDATION; SILICON NITRIDE/SILICON DIOXIDE MASK; STRUCTURE MASK; SUBMICRON ISOLATION REGION; VLSI INTEGRATED CIRCUITS;

INTEGRATED CIRCUITS, VLSI;

EID: 0022201692     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)