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Volumn 132, Issue 11, 1985, Pages 2677-2685

Chemical Vapor Deposition of Ruthenium and Ruthenium Dioxide Films

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE - MANUFACTURE; RUTHENIUM COMPOUNDS - VAPOR DEPOSITION;

EID: 0022162031     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2113647     Document Type: Article
Times cited : (247)

References (21)
  • 13
    • 84975429453 scopus 로고    scopus 로고
    • Unpublished results
    • W. D. Reents, Jr., Unpublished results.
    • Reents, W.D.1
  • 14
    • 0003708258 scopus 로고
    • Handbook of Auger Electron Spectroscopy
    • Perkin-Elmer, Eden Prairie, MN
    • L. E. Davis et al., “Handbook of Auger Electron Spectroscopy, ” Perkin-Elmer, Eden Prairie, MN (1978).
    • (1978)
    • Davis, L.E.1
  • 21
    • 84975343773 scopus 로고
    • S. M. Sze, Editor, Chap. 9, McGraw-Hill, New York
    • D. B. Fraser, in “VLSI Technology, ” S. M. Sze, Editor, Chap. 9, McGraw-Hill, New York (1983).
    • (1983) VLSI Technology
    • Fraser, D.B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.