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Volumn 132, Issue 11, 1985, Pages 2677-2685
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Chemical Vapor Deposition of Ruthenium and Ruthenium Dioxide Films
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Author keywords
[No Author keywords available]
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Indexed keywords
INTEGRATED CIRCUIT MANUFACTURE - MANUFACTURE;
RUTHENIUM COMPOUNDS - VAPOR DEPOSITION;
DAMAGE-FREE DEPOSITION;
ORGANORUTHENIUM COMPLEXES;
RUTHENIUM AND ALLOYS;
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EID: 0022162031
PISSN: 00134651
EISSN: 19457111
Source Type: Journal
DOI: 10.1149/1.2113647 Document Type: Article |
Times cited : (247)
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References (21)
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