Ellipsometric study of orientation-dependent etching of silicon in aqueous KOH

Journal of the Electrochemical Society

Volumn 132, Issue 4, 1985, Pages 871-884

  Palik, E D ^a   Bermudez, V M ^a   Glembocki, O J ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON COMPOUNDS - OPTICAL PROPERTIES;

ELLIPSOMETRIC STUDY; ETCHING OF SILICON; ORIENTATION DEPENDENCE;

SILICON AND ALLOYS;

EID: 0022043722     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2113976     Document Type: Article

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