Megasonic particle removal from solid-state wafers

R.C.A. Review

Volumn 46, Issue 1, 1985, Pages 81-105

  Shwartzman, S ^a   Mayer, A ^a  

^a FCA UNESP   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ULTRASONIC EQUIPMENT;

MEGASONIC PARTICLE REMOVAL; NONCONTACT ELECTRONIC CLEANING SYSTEM;

SEMICONDUCTOR DEVICE MANUFACTURE;

SILICON;

METHODOLOGY; NONHUMAN; PARTICLE MOVEMENT; SEMICONDUCTOR; THEORETICAL STUDY; ULTRASOUND;

EID: 0022029193     PISSN: 00336831     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (45)