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Volumn 32, Issue 3, 1985, Pages 682-690

On the Optimization of VLSI Contacts

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONTACTS, OHMIC - MEASUREMENTS; ELECTRIC MEASUREMENTS - RESISTANCE; ELECTRIC NETWORKS - TRANSMISSION LINE THEORY; SEMICONDUCTOR DEVICES - JUNCTIONS;

EID: 0022025575     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1985.21999     Document Type: Article
Times cited : (19)

References (58)
  • 24
    • 0019021288 scopus 로고
    • A. Singh, in Proc. IEEE, vol. 68, no. 5, p. 627, May 1980
    • (1980) Proc. IEEE , vol.68 , Issue.5 , pp. 627
    • Singh, A.1
  • 57
    • 0020844494 scopus 로고
    • Direct measurement of interfacial contact resistance, end contact resistance, and interfacial contact layer uniformity
    • S. J. Proctor, L. W. Linholm, and J. A. Mazer, “Direct measurement of interfacial contact resistance, end contact resistance, and interfacial contact layer uniformity,” IEEE Trans. Electron Devices, vol. ED-30, no. 11, pp. 1535–1542, Nov. 1983
    • (1983) IEEE Trans. Electron Devices , vol.ED-30 , Issue.11 , pp. 1535-1542
    • Proctor, S.J.1    Linholm, L.W.2    Mazer, J.A.3
  • 58
    • 0021422094 scopus 로고
    • A multiwafer plasma system for anodic nitridation and oxidation
    • J. G. J. Chern and W. G. Oldham, “A multiwafer plasma system for anodic nitridation and oxidation,” IEEE Trans. Electron Device Lett., vol. EDLJ, no. 5, pp. 178–180, May 1984
    • (1984) IEEE Trans. Electron Device Lett , vol.EDL-5 , Issue.5 , pp. 178-180
    • Chern, J.G.J.1    Oldham, W.G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.