Computer simulation of low energy static single crystal sputtering

Nuclear Inst. and Methods in Physics Research, B

Volumn 13, Issue 1-3, 1986, Pages 324-330

  Hou, M ^a   Eckstein, W ^b  

^a UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS; RADIATION EFFECTS - COMPUTER SIMULATION;

ANGULAR EJECTION DISTRIBUTIONS; CHANNELING; MARLOWE PROGRAM;

COPPER AND ALLOYS;

EID: 0022023751     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(86)90521-5     Document Type: Article

References (24)

1. Atom Ejection Patterns in Single-Crystal Sputtering
2. Sputtering Experiments with 1- to 5-keV Ar+ Ions. III. Monocrystal Targets of the Hexagonal Metals Mg, Zn, Zr, and Cd
3. The influence of thermal vibration on focused collision sequences
4. On the Mechanism of Sputtering
5. Topics in Appl. Physics
6. Single-crystal sputtering including the channeling phenomenon
7. Copper single crystal sputtering in the temperature range from 50K to 600K
8. Computer simulation of sputtering II