Properties of LPCVD Aluminum Films Produced by Disproportionation of Aluminum Monochloride

Journal of the Electrochemical Society

Volumn 132, Issue 2, 1985, Pages 457-463

  Levy, R A ^b   Gallagher, P K ^b   Schrey, F ^b  

^a Incorporated ^*  (United Kingdom)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM AND ALLOYS - VAPOR DEPOSITION; ALUMINUM COMPOUNDS - CHEMICAL REACTIONS; FILMS - PREPARATION; INTEGRATED CIRCUITS, VLSI - MATERIALS;

ALUMINUM MONOCHLORIDE; DISPROPORTIONATION; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; LPCVD;

INTEGRATED CIRCUITS;

EID: 0022010747     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2113865     Document Type: Article

References (10)

1. R. A. Levy, M. L. Green, and P. K. Gallagher, This Journal, 131, 2175 (1984).
2. M. L. Green, R. A. Levy, R. G. Nuzzo, and E. Coleman, Thin Solid Films. 114. 367 (1984).
3. M. J. Cooke, R. A. Heinecke, R. C. Stern, and J. W. C. Maes, Solid city-group Technol., 62 (1982).
4. A. Malazgirt and J. W. Evans, Metall. Trans., 11B, 225 (1980).
5. R. A. Levy, L. C. Parrillo, L. J. Lecheler, and R. V. Knoell, This Journal, 132, 159 (1985).
6. W. M. Feist, S. R. Steele, and D. W. Readey, in “Physics of Thin Films,” Vol. 5, G. Hass and R. E. Thun, Editors, Academic Press, New York (1969).
7. K. Wade and A. J. Banister, in “Comprehensive Inorganic Chemistry,” p. 993, Pergamon Press, Oxford, England (1973).
8. H. Villa, J. Soc. Chem. Ind., 59 (1950).
9. S. Vaidya, D. B. Fraser, and A. K. Sinha, Proc. 18th Rel. Phys. Symp. IEEE, 165 (1980).
10. P. S. McLeod and J. L. Hughes, J. Vac. Sci. Technol., 16, 369 (1979).