Phase gratings as waferstepper alignment marks for all process layers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 538, Issue , 1985, Pages 24-31

  Wittekoek, S ^a,b   Van Der Werf, J ^a   George, R A ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b ASM Lithography   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL INSTRUMENTS - GRATINGS;

ALIGNMENT ACCURACY; LIGHT INTENSITY; PHASE GRATINGS; PROCESSING LAYERS; RESIST LAYERS; WAFER STEPPER ALIGNMENT;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0021974473     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.947743     Document Type: Conference Paper

References (5)

1. V. Miller, H.L. Stover, “Submicron Optical Lithography”, Solid State Technolohy, January 1985, p127.
2. M. Kameyama, “Optical performance of a Waferstepper with I-line lens”, Kodak Microelectronics Seminar, October 1984.
3. G. Bouwhuis, S. Wittekoek, “Automatic Alignment System for Optical Projection Printing”, IEEE Transactions on Electron Devices, Vol 26 (1979), p725.
4. S. Wittekoek, “Step and Repeat Wafer Imaging”, Proc. of the SPIE Seminar on Microlithography V, 1981, Vol 221, p2.
5. R. Kramer, R. Vervoordeldonk, S. Wittekoek, R. Beem and G. van der Looy, “Philips Wafer Stepper: characterization and processing experience”, Proc. SPIE 334, 1982, p95.