SUBMICROMETER PATTERNING BY PROJECTED EXCIMER-LASER-BEAM INDUCED CHEMISTRY.

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

Volumn 3, Issue 1, 1985, Pages 1-8

  Ehrlich, D J ^a   Tsao, J Y ^a   Bozler, C O ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE - LASER APPLICATIONS; LASERS, GAS; LITHOGRAPHY - LASER APPLICATIONS;

EXCIMER LASERS; LASER-ACTIVATED SURFACE CHEMISTRY; SUBMICROMETER PATTERNING;

INTEGRATED CIRCUITS, THIN FILM;

EID: 0021857048     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.583226     Document Type: Article

References (18)