COMPOSITE—A Complete Modeling Program of Silicon Technology

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Volumn 4, Issue 4, 1985, Pages 421-430

  Lorenz, Jurgen ^a   Pelka, Joachim ^b   Ryssel, Heiner ^c   Sachs, Albert ^d   Seidl, Albert ^e   Svoboda, Miloğ ^e  

^a Fraunhofer Arbeitgsgruppe für Integrierte Schaltungen ^*  (Germany)

^b FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

^c UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^d UNIVERSITY OF MUNICH   (Germany)

^e IFT INSTITUT FÜR THERAPIEFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; LITHOGRAPHY; SEMICONDUCTOR MATERIALS - DOPING;

2-D PROCESS MODELING; LAYER DEPOSITION; MENU-DRIVEN PROGRAM; OXIDATION MODELING;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0021508102     PISSN: 02780070     EISSN: 19374151     Source Type: Journal    
DOI: 10.1109/TCAD.1985.1270140     Document Type: Article

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