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Volumn 5, Issue 5, 1984, Pages 148-150

Temperature Dependence of Hot-Electron-Induced Degradation in MOSFET's

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICES - DEGRADATION;

EID: 0021427595     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/EDL.1984.25865     Document Type: Article
Times cited : (71)

References (12)
  • 1
    • 0018457253 scopus 로고
    • 1 µm MOSFET VLSI technology: part IV-Hot-electron design constraints
    • T. H. Ning et al., “1 µm MOSFET VLSI technology: part IV-Hot-electron design constraints,” IEEE Trans. Electron Devices, vol. EDL-26, pp. 346, 1979.
    • (1979) IEEE Trans. Electron Devices , vol.EDL-26 , pp. 346
    • Ning, T.H.1
  • 2
    • 0020733451 scopus 로고
    • An empirical model for device degradation due to hot-carrier injection
    • E. Takeda and N. Suzuki, “An empirical model for device degradation due to hot-carrier injection,” IEEE Electron Device Lett., vol. EDL-4, pp. 111, 1983.
    • (1983) IEEE Electron Device Lett. , vol.EDL-4 , pp. 111
    • Takeda, E.1    Suzuki, N.2
  • 3
    • 84945719958 scopus 로고
    • A physical model for hot-electron induced degradation in MOSFET's
    • Ft. Lauderdale, FL, Dec.
    • S. Tam and F-C. Hsu “A physical model for hot-electron induced degradation in MOSFET's,” IEEE Semiconductor Interface Specialist Conf., Ft. Lauderdale, FL, Dec. 1983.
    • (1983) IEEE Semiconductor Interface Specialist Conf.
    • Tam, S.1    Hsu, F.-C.2
  • 5
    • 0019606794 scopus 로고
    • Effect of long-term stress on IGFET degradations due to hot electron trapping
    • H. Matsumoto et al., “Effect of long-term stress on IGFET degradations due to hot electron trapping,” IEEE Trans. Electron Devices, vol. EDL-28, pp. 923, 1981.
    • (1981) IEEE Trans. Electron Devices , vol.EDL-28 , pp. 923
    • Matsumoto, H.1
  • 6
    • 0020737516 scopus 로고
    • The effect of temperature on hot electron trapping in MOSFET's
    • Y. Satoh et al., “The effect of temperature on hot electron trapping in MOSFET's,” Japan J. Appl. Phys., vol. 22, pp. L221, 1983.
    • (1983) Japan J. Appl. Phys. , vol.22 , pp. L221
    • Satoh, Y.1
  • 7
    • 0020208332 scopus 로고
    • Correlation between substrate and gate currents in MOSFET's
    • S. Tam et al., “Correlation between substrate and gate currents in MOSFET's,” IEEE Trans. Electron Devices, vol. ED-29, pp. 1740, 1982.
    • (1982) IEEE Trans. Electron Devices , vol.ED-29 , pp. 1740
    • Tam, S.1
  • 10
    • 0009667182 scopus 로고
    • Temperature dependence of avalanche multiplication in semiconductors
    • C. R. Crowell and S. M. Sze, “Temperature dependence of avalanche multiplication in semiconductors,” Appl. Phys. Lett., vol. 9, pp. 242, 1966.
    • (1966) Appl. Phys. Lett. , vol.9 , pp. 242
    • Crowell, C.R.1    Sze, S.M.2
  • 11
    • 0020783304 scopus 로고
    • Hot-electron currents in very short channel MOSFET's
    • S. Tam et al., “Hot-electron currents in very short channel MOSFET's,” IEEE Electron Device Lett., vol. EDL-4, pp. 249, 1983.
    • (1983) IEEE Electron Device Lett. , vol.EDL-4 , pp. 249
    • Tam, S.1
  • 12
    • 0020952509 scopus 로고
    • Hot-electron effects in MOSFET's
    • C. Hu, “Hot-electron effects in MOSFET's,” IEDM Tech. Dig., 1983, pp. 176.
    • (1983) IEDM Tech. Dig. , pp. 176
    • Hu, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.