Study of electrical characteristics on thermally nitrided SiO2(Nitroxide) films

Journal of the Electrochemical Society

Volumn 131, Issue 4, 1984, Pages 875-877

  Lee, Ming Kwang ^b   Tseng, Fang Churng ^a   Chang, Chun Yen ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; FILMS - METALLIC;

SILICON DIOXIDE;

SILICON COMPOUNDS;

EID: 0021409073     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2115718     Document Type: Article

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