EPOXY DEGRADATION INDUCED Au-Al INTERMETALLIC VOID FORMATION IN PLASTIC ENCAPSULATED MOS MEMORIES.

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1984, Pages 37-47

  Gale, Rebecca J ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE IMPURITIES; EPOXY DEGRADATION; GOLD ALUMINUM BONDS; INTERMETALLIC VOIDS; METAL OXIDE SEMICONDUCTORS; PLASTIC ENCAPSULATED MOS MEMORIES;

SOLID STATE DEVICES;

EID: 0021316842     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)