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Volumn , Issue , 1984, Pages 152-155
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CHARACTERISTICS & RELIABILITY OF 100 A degree OXIDES.
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
ACTIVATION ENERGY;
DOUBLE LEVEL POLYSILICON PROCESS;
ELECTRIC FIELD ACCELERATION;
ELECTRICAL PROPERTIES;
RELIABILITY OF THIN OXIDES;
SILICON DIOXIDE FILMS;
SEMICONDUCTING FILMS;
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EID: 0021305050
PISSN: 00999512
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (39)
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References (0)
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