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Polymer Engineering & Science

Volumn 23, Issue 18, 1983, Pages 1012-1018

Chemical amplification in the design of dry developing resist materials

(2) Ito, Hiroshi a Willson, C Grant a

a IBM ALMADEN RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; ELECTRON BEAMS; ORGANIC COMPOUNDS - CHEMISTRY; PHOTORESISTS - DESIGN; ULTRAVIOLET RADIATION;

CHEMICAL AMPLIFICATION;

POLYMERS;

EID: 0020938226 PISSN: 00323888 EISSN: 15482634 Source Type: Journal
DOI: 10.1002/pen.760231807 Document Type: Article

Times cited : (542)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.