Amorphous BN films produced in a double-plasma reactor for semiconductor applications

Solid State Electronics

Volumn 26, Issue 10, 1983, Pages 931-939

  Schmolla, W ^a   Hartnagel, H L ^a  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICES;

SEMICONDUCTING FILMS;

EID: 0020834177     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1101(83)90069-2     Document Type: Article

References (12)

1. Properties of BN films produced by a low-temperature double-plasma process
2. Conduction in thin dielectric films
3. Untersuchung dünner Isolatorschichten für Bauelementeanwendungen
4. Low Temperature Double-Plasma Process for BN Films on Semiconductors