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Journal of Applied Physics

Volumn 54, Issue 9, 1983, Pages 5064-5068

Stress in chemical-vapor-deposited SiO2 and plasma-SiN x films on GaAs and Si

(1) Blaauw, C a

a NORTEL NETWORKS (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS - DIELECTRIC; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES; STRESSES;

SILICON COMPOUNDS;

EID: 0020824265 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.332779 Document Type: Article

Times cited : (60)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.