SURFACE ROUGHNESS SCATTERING AT THE Si-SiO2 INTERFACE.

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 1, Issue 3, 1983, Pages 803-808

  Goodnick, S M ^a   Gann, R G ^a   Sites, J R ^a   Ferry, D K ^a   Wilmsen, C W ^a   Fathy, D ^a   Krivanek, O L ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES, MOS - SEMICONDUCTOR INSULATOR BOUNDARIES;

TRANSISTORS, FIELD EFFECT;

EID: 0020782696     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582696     Document Type: Conference Paper

References (19)