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Volumn 4, Issue 7, 1983, Pages 236-239

Analysis of the Channel Inversion Layer Capacitance in the Very Thin-Gate IGFET

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC NETWORKS - EQUIVALENT CIRCUITS;

EID: 0020781816     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/EDL.1983.25717     Document Type: Article
Times cited : (21)

References (11)
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    • (1966) Solid-State Electron , vol.9 , pp. 927-937
    • Pao, H.C.1    Sah, C.T.2
  • 2
    • 0016116644 scopus 로고
    • Design of ion-implanted MOSFET's with very small physical dimensions
    • Oct.
    • R. H. Dennard et al., “Design of ion-implanted MOSFET's with very small physical dimensions,” IEEE J. Solid-State Circuits, pp. 256–268, Oct. 1974.
    • (1974) IEEE J. Solid-State Circuits , pp. 256-268
    • Dennard, R.H.1
  • 3
    • 0016621575 scopus 로고
    • Static characteristics of extremely thin gate oxide M.O.S. transistors
    • Dec. 11
    • Yutaka Hayashi, “Static characteristics of extremely thin gate oxide M.O.S. transistors,” Electron. Lett., vol. 11, Dec. 11, 1975.
    • (1975) Electron. Lett. , vol.11
    • Hayashi, Y.1
  • 4
    • 0020114911 scopus 로고
    • MOS device and technology constraints in VLSI
    • Apr.
    • Y. A. El-Mansy, “MOS device and technology constraints in VLSI.” IEEE Trans. Electron Devices, vol. ED-29, pp. 567–573, Apr. 1982.
    • (1982) IEEE Trans. Electron Devices , vol.ED-29 , pp. 567-573
    • El-Mansy, Y.A.1
  • 5
    • 0003235865 scopus 로고
    • Statistical considerations in MOS calculations
    • T. I. Kamins and R. S. Muller, “Statistical considerations in MOS calculations,” Solid-State Electron., vol. 10, pp. 423, 1967.
    • (1967) Solid-State Electron , vol.10 , pp. 423
    • Kamins, T.I.1    Muller, R.S.2
  • 6
    • 0001156050 scopus 로고
    • June
    • F. Stern, Phys. Rev., vol. 5, pp. 4891–4899, June 1972.
    • (1972) Phys. Rev. , vol.5 , pp. 4891-4899
    • Stern, F.1
  • 7
    • 0020270148 scopus 로고
    • Transconductance degradation in thin-oxide MOSFET's
    • Dec.
    • G. Baccarani and M. Wordeman, “Transconductance degradation in thin-oxide MOSFET's,” in IEDM Tech. Dig., pp. 278–281, Dec. 1982.
    • (1982) IEDM Tech. Dig. , pp. 278-281
    • Baccarani, G.1    Wordeman, M.2
  • 8
    • 0020186076 scopus 로고
    • Charge accumulation and mobility in thin dielectric MOS transistors
    • C. G. Sodini, T. W. Ekstedt, and J. L. Moll, “Charge accumulation and mobility in thin dielectric MOS transistors,” Solid-State Electron., vol. 25, pp. 833, 1982.
    • (1982) Solid-State Electron , vol.25 , pp. 833
    • Sodini, C.G.1    Ekstedt, T.W.2    Moll, J.L.3
  • 9
    • 0019045194 scopus 로고
    • Nonplannar VLSI device analysis using the solution of Poisson's equation
    • Aug.
    • J. A. Greenfield and R. W. Dutton, “Nonplannar VLSI device analysis using the solution of Poisson's equation,” IEEE Trans. Electron Devices, vol. ED-27, pp. 1520, Aug. 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 1520
    • Greenfield, J.A.1    Dutton, R.W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.