The Effect of Substituents on the Photosensitivity of 2-Nitrobenzyl Ester Deep U.V. Resists

Journal of the Electrochemical Society

Volumn 130, Issue 6, 1983, Pages 1433-1437

  Reichmanis, E ^a   Wilkins, C W ^a   Price, D A ^a   Chandross, E A ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

photodegradation; photolithography; resists

Indexed keywords

PHOTORESISTS;

EID: 0020764701     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2119968     Document Type: Article

References (8)

1. V. N. Rajeskharan Pillai, Synthesis, 1 (1980).
2. B. Amit, U. Zehavi, and A. Patchornik, Israel J. Chem., 12, 103 (1974).
3. E. Reichmanis, C. W. Wilkins, Jr., and E. A. Chandross, J. Vac. Sci. Technol, 19, 1338 (1981).
4. C. W. Wilkins, Jr., E. Reichmanis, and E. A. Chandross, Submitted for publication.
5. P. M. Kochergin and K. S. Bushueva, Zh. Obshch. Khim., 32, 3033 (1962).
6. F. Cortese and L. Bauman, J. Am. Chem. Soc., 57, 1393 (1935).
7. P. A. Leighton and F. A. Lucy, J. Chem. Phys., 2, 756 (1934).
8. H. Barzynski, M-J. Jun, D. Saenger, and O. Volkert, U.S. Pat. 3, 849, 137 (1974).