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Journal of Applied Physics

Volumn 54, Issue 5, 1983, Pages 2660-2666

Energy dependence of the sputtering yield of silicon bombarded with neon, argon, krypton, and xenon ions

(1) Zalm, P C a

a PHILIPS RESEARCH LABORATORIES (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; IONS; KRYPTON; NEON; XENON;

SEMICONDUCTING SILICON;

EID: 0020748016 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.332340 Document Type: Article

Times cited : (161)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.