Light ion sputtering of low Z materials in the temperature range 20-1100°C

Journal of Nuclear Materials

Volumn 123, Issue 1-3, 1984, Pages 1417-1424

  Bohdansky, J ^a   Roth, J ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BERYLLIUM AND ALLOYS; CARBIDES; GRAPHITE; NUCLEAR REACTORS, FUSION - MATERIALS; PLASMAS;

BORON CARBIDE; IRON EVAPORATED ON GRAPHITE AS PROTECTIVE LAYER; LIGHT ION SPUTTERING; SILICON CARBIDE; TITANIUM CARBIDE;

SPUTTERING;

EID: 0020745628     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3115(84)90278-2     Document Type: Article

References (22)

1. Data on Low Energy Light Ion Sputtering
2. A Critical Review of Carbon and Carbide Erosion Data by Hydrogen for Fusion Reactor Applications
3. Sputtering of Be and BeO by light ions
4. Erosion of carbon due to bombardment with energetic ions at temperatures up to 2000 K
5. Chemical sputtering yields of titanium carbides
6. AES-SIMS(IMA)study of physical and chemical sputtering processesof low-Z materials by energetic ions
7. Sputtering Yield Data Base
8. The Kinetics of the Reactions of Beryllium with Oxygen and Nitrogen and the Effect of Oxide and Nitride Films on its Vapor Pressure