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Volumn 2, Issue 2, 1983, Pages 111-116

An Efficient Numerical Algorithm for Simulation of MOS Capacitance

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER PROGRAMMING - ALGORITHMS;

EID: 0020737810     PISSN: 02780070     EISSN: 19374151     Source Type: Journal    
DOI: 10.1109/TCAD.1983.1270027     Document Type: Article
Times cited : (17)

References (16)
  • 1
    • 84939051223 scopus 로고
    • Numerical simulation of MOS capacitance for a wide range of temperatures, impurity profiles and surface state densities
    • Feb. 15, 280
    • R. C. Jaeger, F. H. Gaensslen, and S. E. Diehl, “Numerical simulation of MOS capacitance for a wide range of temperatures, impurity profiles and surface state densities,” in 1982 ISSCC Dig., Feb. 1982, pp. 14, 15, 280.
    • (1982) 1982 ISSCC Dig. , pp. 14
    • Jaeger, R.C.1    Gaensslen, F.H.2    Diehl, S.E.3
  • 2
    • 0000339559 scopus 로고
    • Investigations of thermally oxidized surfaces using metal-oxide-semiconductor structures
    • Feb.
    • A. S. Grove, B. E. Deal, E. H. Snow, and C. T. Sah, “Investigations of thermally oxidized surfaces using metal-oxide-semiconductor structures,” Solid-State Electron., vol. 8, pp. 145-163, Feb. 1965.
    • (1965) Solid-State Electron. , vol.8 , pp. 145-163
    • Grove, A.S.1    Deal, B.E.2    Snow, E.H.3    Sah, C.T.4
  • 3
    • 84916528172 scopus 로고
    • Limitations of MOS capacitor method for the determination of semiconductor surface properties
    • Apr.
    • G. Zaininger and G. Warfield, “Limitations of MOS capacitor method for the determination of semiconductor surface properties,” IEEE Trans. Electron Devices, vol. ED-12, pp. 179-193, Apr. 1965.
    • (1965) IEEE Trans. Electron Devices , vol.ED-12 , pp. 179-193
    • Zaininger, G.1    Warfield, G.2
  • 4
    • 84981845607 scopus 로고
    • Field-effect capacitance analysis of surface states on silicon
    • Mar.
    • K. Lehovec, A. Slobodskoy, and J. Sprague, “Field-effect capacitance analysis of surface states on silicon,” Phys. Status Solidi, vol. 3, pp. 447-464, Mar. 1963.
    • (1963) Phys. Status Solidi , vol.3 , pp. 447-464
    • Lehovec, K.1    Slobodskoy, A.2    Sprague, J.3
  • 5
    • 49949142570 scopus 로고
    • Carrier concentration and minority carrier lifetime measurement in silicon epitaxial layers by the MOS capacitance method
    • Apr.
    • C. Jund and R. Poirier, “Carrier concentration and minority carrier lifetime measurement in silicon epitaxial layers by the MOS capacitance method,” Solid-State Electron., vol. 9, pp. 315-320, Apr. 1966.
    • (1966) Solid-State Electron. , vol.9 , pp. 315-320
    • Jund, C.1    Poirier, R.2
  • 8
    • 0019018746 scopus 로고
    • Simulation of impurity freezeout through numerical solution of Poisson's equation with application to MOS device behavior
    • May
    • R. C. Jaeger and F. H. Gaensslen, “Simulation of impurity freezeout through numerical solution of Poisson's equation with application to MOS device behavior,” IEEE Trans. Electron Devices, vol. ED-27, pp. 914-920, May 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 914-920
    • Jaeger, R.C.1    Gaensslen, F.H.2
  • 9
    • 0016519173 scopus 로고
    • Computer solution of one-dimensional Poisson's equation
    • June
    • R. W. Klopfenstein and C. P. Wu, “Computer solution of one-dimensional Poisson's equation,” IEEE Trans. Electron Devices, vol. ED-22, pp. 329-333, June 1975.
    • (1975) IEEE Trans. Electron Devices , vol.ED-22 , pp. 329-333
    • Klopfenstein, R.W.1    Wu, C.P.2
  • 10
    • 84886361962 scopus 로고
    • Standardized terminology for oxide charges associated with thermally oxidized silicon
    • Mar.
    • B. E. Deal, “Standardized terminology for oxide charges associated with thermally oxidized silicon,” IEEE Trans. Electron Devices, vol. ED-27, pp. 606-608, Mar. 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 606-608
    • Deal, B.E.1
  • 12
    • 0017466169 scopus 로고
    • Very small MOSFET's for low-temperature operation
    • Mar.
    • F. H. Gaensslen et al., “Very small MOSFET's for low-temperature operation,” IEEE Trans. Electron Devices, vol. ED-24, pp. 218-229, Mar. 1977.
    • (1977) IEEE Trans. Electron Devices , vol.ED-24 , pp. 218-229
    • Gaensslen, F.H.1
  • 13
    • 0005039214 scopus 로고
    • Freezeout characteristics of the MOS varactor
    • Oct.
    • P. V. Gray and D. M. Brown, “Freezeout characteristics of the MOS varactor,” Appl. Phys. Lett., vol. 13, pp. 247-248, Oct. 1968.
    • (1968) Appl. Phys. Lett. , vol.13 , pp. 247-248
    • Gray, P.V.1    Brown, D.M.2
  • 14
    • 84944816993 scopus 로고
    • Ideal MOS curves for Silicon
    • A. Goetzberger, “Ideal MOS curves for Silicon,” Bell Syst. Tech. J., vol. 45, pp. 1097-1122, 1966.
    • (1966) Bell Syst. Tech. J. , vol.45 , pp. 1097-1122
    • Goetzberger, A.1
  • 15
    • 0018457220 scopus 로고
    • Temperature dependent threshold behavior of depletion-mode MOSFET's–characterization and simulation
    • Apr.
    • F. H. Gaensslen and R. C. Jaeger, “Temperature dependent threshold behavior of depletion-mode MOSFET's–characterization and simulation,” Solid-State Electron., vol. 22, pp. 423-430, Apr. 1979.
    • (1979) Solid-State Electron. , vol.22 , pp. 423-430
    • Gaensslen, F.H.1    Jaeger, R.C.2
  • 16
    • 0019542002 scopus 로고
    • Behavior of electrically small depletion-mode MOSFET's at low temperatures
    • Mar.
    • F. H. Gaensslen and R. C. Jaeger, “Behavior of electrically small depletion-mode MOSFET's at low temperatures,” Solid-State Electron., vol. 24, pp. 215-220, Mar. 1981.
    • (1981) Solid-State Electron. , vol.24 , pp. 215-220
    • Gaensslen, F.H.1    Jaeger, R.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.