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Volumn , Issue , 1982, Pages 292-299

ELECTROMIGRATION-INDUCED FAILURES IN VLSI INTERCONNECTS.

(1)  Ghate, P B a  

a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMIGRATION DAMAGE; FAILURE RATE PREDICTIONS; MEDIAN TIME TO FAILURE; MICROSTRUCTURAL INHOMOGENEITIES; RELIABILITY ASSURANCE; VLSI INTERCONNECTION STATISTICS;

EID: 0020304389     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/irps.1982.361948     Document Type: Conference Paper
Times cited : (40)

References (0)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.