A Survey of Iron Contamination in Silicon Substrates and Its Impact on Circuit Yield

Journal of the Electrochemical Society

Volumn 129, Issue 11, 1982, Pages 2573-2576

  Ward, P J ^a  

^a Plessey Research Caswell   (United Kingdom)

Author keywords

contaminants; gettering; IC processing; silicon defects

Indexed keywords

INTEGRATED CIRCUITS;

SEMICONDUCTING SILICON - IMPURITIES;

EID: 0020208788     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2123612     Document Type: Article

References (6)

1. A. Mayer, Solid State Technol, 38 (April 1972).
2. Y. H. Lee, R. L. Kleinherz, and J. W. Corbett, Appl. Phys. Lett., 31,142 (1977).
3. B. D. Stone, D. B. Hines, S. L. Gunn, and D. Mc-Kown, Solid State Technol., 68 (January 1979).
4. P. F. Schmidt and C. W. Pearce, Journal of the Electrochemical Society, 128, 630 (1981).
5. P. D. Augustus, J. Knights, and L. W. Kennedy, J. Microscopy, 118, 315 (March 1980).
6. C. B. Collins and R. O. Carlson, Phys. Rev., 108,1409 (1957).