Dopant diffusion in tungsten silicide

Journal of Applied Physics

Volumn 53, Issue 4, 1982, Pages 3059-3062

  Pan, Paihung ^a   Hsieh, Ning ^a   Geipel Jr , Henry J ^a   Slusser, George J ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

TUNGSTEN SILICON ALLOYS;

EID: 0020114824     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.331050     Document Type: Article

References (9)