NMR and IR studies on hydrogenated amorphous Si1-xCx films

Japanese Journal of Applied Physics

Volumn 21, Issue 3 A, 1982, Pages L176-L178

  Nakazawa, Kenji ^a   Ueda, Shoichi ^a   Kumeda, Minoru ^a   Morimoto, Akiharu ^a   Shimizu, Tatsuo ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INFRARED RADIATION; MAGNETIC RESONANCE;

SILICON CARBON ALLOYS - AMORPHOUS;

EID: 0020097813     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.21.L176     Document Type: Article

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