Impact ionization at very low voltages in silicon

Journal of Applied Physics

Volumn 53, Issue 2, 1982, Pages 1244-1247

  Eitan, B ^a   Frohman Bentchkowsky, D ^a   Shappir, J ^a  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON;

EID: 0020091438     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.330539     Document Type: Article

References (16)