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Volumn 29, Issue 1, 1982, Pages 151-154

Briefs: Silicon Hall-Effect Power Ic'S For Brushless Motors

Author keywords

[No Author keywords available]

Indexed keywords

HALL EFFECT DEVICES;

EID: 0019914511     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1982.20673     Document Type: Article
Times cited : (25)

References (6)
  • 1
    • 0343263905 scopus 로고
    • A Hall device in an integrated circuit
    • G. Bosch, “A Hall device in an integrated circuit,“ Solid-State Electron., vol. 11, pp. 712-714, 1968.
    • (1968) Solid-State Electron , vol.11 , pp. 712-714
    • Bosch, G.1
  • 2
    • 84949079530 scopus 로고    scopus 로고
    • Effect of mechanical stress on the offset voltages of Hall devices in Si IC
    • Phys. Status. Solidi (a),
    • Y. Kanda and M. Migitaka, “Effect of mechanical stress on the offset voltages of Hall devices in Si IC,“ Phys. Status. Solidi (a),
    • Kanda, Y.1    Migitaka, M.2
  • 3
    • 84987093749 scopus 로고
    • Design considerations for Hall device in Si IC,“ Phys
    • Status Solidi (a), vol. 38, pp. K41-K44
    • Y. Kanda and M. Migitaka, “Design considerations for Hall device in Si IC,“ Phys. Status Solidi (a), vol. 38, pp. K41-K44, 1976.
    • (1976)
    • Kanda, Y.1    Migitaka, M.2
  • 4
    • 84988767171 scopus 로고    scopus 로고
    • A graphical representation of the piezoresistance coefficients in silicon
    • this issue,
    • Y. Kanda, “A graphical representation of the piezoresistance coefficients in silicon,“ this issue, pp. 64-70.
    • Kanda, Y.1
  • 5
    • 84949081902 scopus 로고    scopus 로고
    • Young's modulus, shear modulus, and Poisson's ratio in silicon and germanium,“
    • J. J. Wortman and R. A. Evans, “Young's modulus, shear modulus, and Poisson's ratio in silicon and germanium,“ J. Appl. Phys., vol.
    • J. Appl. Phys
    • Wortman, J.J.1    Evans, R.A.2
  • 6
    • 0004195831 scopus 로고
    • Ion Implantation in Semiconductors
    • New York: Academic Press, ch. 6
    • J. W. Mayer, L. Ericksson, and J. A. Davies, Ion Implantation in Semiconductors. New York: Academic Press, 1970, ch. 6, p. 224.
    • (1970) , pp. 224
    • Mayer, J.W.1    Ericksson, L.2    Davies, J.A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.