SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Nuclear Instruments and Methods

Volumn 191, Issue 1-3, 1981, Pages 327-334

Profile distortions and atomic mixing in SIMS analysis using oxygen primary ions

(2) Wittmaack, K a Wach, W a

a INSTITUTE OF EPIDEMIOLOGY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON - ION IMPLANTATION;

MASS SPECTROMETERS;

EID: 0019760909 PISSN: 0029554X EISSN: None Source Type: Journal
DOI: 10.1016/0029-554X(81)91024-7 Document Type: Article

Times cited : (94)

References (23)

1
- 0019022222
- (1980) Surf. Interf. Anal. , vol.2 , pp. 91
- Clegg¹

2
- 0015575494
- (1973) Rad. Effects , vol.18 , pp. 211
- Schulz¹ Wittmaack² Maul³

3
- 13044307569
- (1974) Radiation Effects , vol.21 , pp. 209
- McHugh¹

4
- 0005413134
- B.L. Crowder, Plenum, New York
- (1973) Ion implantation in semiconductors and other materials , pp. 119
- Wittmaack¹ Maul² Schulz³

5
- 0017914696
- (1978) Nucl. Instr. and Meth. , vol.149 , pp. 259
- Wach¹ Wittmaack²

6
- 0019560073
- (1981) J. Appl. Phys. , vol.52 , pp. 3341
- Wach¹ Wittmaack²

7
- 0019038124
- (1980) Appl. Surf. Sci. , vol.5 , pp. 221
- Reuter¹ Wittmaack²

8
- 0005309198
- (1980) Appl. Phys. Lett. , vol.37 , pp. 285
- Wittmaack¹ Clegg²

9
- 0005362820
- (1962) Proc. Phys. Soc. , vol.79 , pp. 299
- Carter¹ Colligon² Leck³

10
- 0009711402
- (1975) Int. J. Mass Spectrom. Ion Phys. , vol.17 , pp. 39
- Wittmaack¹

11
- 0017138088
- (1976) Rad. Effects , vol.29 , pp. 31
- Schulz¹ Wittmaack²

12
- 0000485936
- (1980) Nuclear Instruments and Methods , vol.168 , pp. 343
- Wittmaack¹

13
- 0018493111
- (1979) J. Vac. Sci. Technol. , vol.16 , pp. 1027
- Wittmaack¹

14
- 0017458848
- (1977) Appl. Phys. , vol.12 , pp. 149
- Wittmaack¹

15
- 0018443252
- (1979) J. Appl. Phys. , vol.50 , pp. 1519
- Blank¹ Wittmaack²

16
- 3643090763
- (1969) Phys. Rev. , vol.184 , pp. 383
- Sigmund¹

17
- 0007294770
- (1971) J. Appl. Phys. , vol.42 , pp. 480
- EerNisse¹

18
- 84908752987
- A. Benninghoven et al., Springer, Berlin
- (1970) Secondary ion mass spectrometry SIMS II , pp. 97
- Kempf¹

19
- 85025774664
- (1980) Journal of Nuclear Materials , vol.93-94 , pp. 581
- Wittmaack¹ Staudenmaier²

20
- 0018232255
- (1978) Rad. Effects , vol.39 , pp. 81
- Wittmaack¹ Blank² Wach³

21
- 84908722696
- K. Wittmaack, Surface Sci., in press.

22
- 6244271871
- (1980) Nucl. Instr. and Meth. , vol.168 , pp. 329
- Littmark¹ Hofer²

23
- 84908737874
- W. Wach and K. Wittmaack, to be published.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.