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1
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0016526028
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Characterization of positive photoresist
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July
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F. H. Dill, W. D. Hornberger, P, S. Hauge, and J. M. Shaw, “Characterization of positive photoresist,” IEEE Trans. Electron Devices, ED-22, no. 7, p. 445, July 1975.
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(1975)
IEEE Trans. Electron Devices
, vol.ED-22
, Issue.7
, pp. 445
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Dill, F.H.1
Hornberger, W.D.2
Hauge, P.S.3
Shaw, J.M.4
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2
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0016522738
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In-situ measurement of dielectric thickness during etching or developing processes
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July
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K. L. Konnerth and F. H. Dill, “In-situ measurement of dielectric thickness during etching or developing processes,” IEEE Trans. Electron Devices, ED-22, no. 7, p. 452, July 1975.
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(1975)
IEEE Trans. Electron Devices
, vol.ED-22
, Issue.7
, pp. 452
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Konnerth, K.L.1
Dill, F.H.2
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3
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0018308228
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In-situ characterization of positive resist development
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January-February
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W. G. Oldham, “In-situ characterization of positive resist development,” Optical Engineering, vol. 18, no. 1, p. 59, January–February 1979.
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(1979)
Optical Engineering
, vol.18
, Issue.1
, pp. 59
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Oldham, W.G.1
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4
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0019018747
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Photosolubility of diazoquinone resists
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May
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D. Meyerhofer, “Photosolubility of diazoquinone resists,” IEEE Trans. Electron Devices, ED-27, no. 5, p. 921, May 1980.
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(1980)
IEEE Trans. Electron Devices
, vol.ED-27
, Issue.5
, pp. 921
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Meyerhofer, D.1
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5
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0001506523
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IOTA, a new computer controlled thin film thickness measurement tool
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K. L. Konnerth and F. H. Dill, “IOTA, a new computer controlled thin film thickness measurement tool,” Solid-State Electron., vol. 15, pp. 371–380, 1972.
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(1972)
Solid-State Electron.
, vol.15
, pp. 371-380
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Konnerth, K.L.1
Dill, F.H.2
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6
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84938007121
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Characterization of mid UV resists: photochemistry and models
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Santa Barbara, California, June 24–26
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D. C. Hofer and C. G. Wilson, “Characterization of mid UV resists: photochemistry and models,” Electronic Materials Conference, Santa Barbara, California, June 24–26., 1981.
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(1981)
Electronic Materials Conference
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Hofer, D.C.1
Wilson, C.G.2
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7
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0018457024
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A general simulator for VLSI lithography and etching processes: part I-application to projection lithography
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April
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W. G. Oldham, S. M. Nandgaonkar, A. R. Neureuther, and M. M. O'Toole, “A general simulator for VLSI lithography and etching processes: part I-application to projection lithography,” IEEE Trans. Electron Devices, ED-26, no. 4, p. 717, April 1979.
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(1979)
IEEE Trans. Electron Devices
, vol.ED-26
, Issue.4
, pp. 717
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Oldham, W.G.1
Nandgaonkar, S.M.2
Neureuther, A.R.3
O'Toole, M.M.4
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8
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0017490398
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Thermal effects on the photoresist AZI350J
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May
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F. H. Dill and J. M. Shaw, “Thermal effects on the photoresist AZI350J,” IBM J. Res. Develop., vol. 21, no. 3, pp. 210–218, May 1977.
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(1977)
IBM J. Res. Develop.
, vol.21
, Issue.3
, pp. 210-218
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Dill, F.H.1
Shaw, J.M.2
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