Measurement of sputtering rate for 10 keV O2+ ions with ion microanalyzer

Japanese Journal of Applied Physics

Volumn 20, Issue 12, 1981, Pages 2313-2317

  Okajima, Yoshiaki ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER AND ALLOYS - SPUTTERING; MICROANALYSIS; NICKEL AND ALLOYS; SILICON AND ALLOYS - SPUTTERING; SILVER AND ALLOYS - SPUTTERING;

SPUTTERING;

EID: 0019685273     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.20.2313     Document Type: Article

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