Light scattering surface roughness characterization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 276, Issue , 1981, Pages 136-139

  Detrio, John A ^a  

^a UNIVERSITY OF DAYTON RESEARCH INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINANT DETECTION IN SEMICONDUCTORS; SCATTERING RATIO; SILICON SURFACE ROUGHNESS CHARACTERIZATION; THEORETICAL FOUNDATION; TOPOGRAPHY OF SMOOTH REFLECTING SURFACE; TOTAL INTEGRATED SCATTER (TIS) METHOD;

LIGHT;

EID: 0019647380     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.931699     Document Type: Conference Paper

References (3)

1. M. Martin and H. Williams, EOSD, 45, September 1980.
2. H. E. Bennett and J. Porteus, J. Opt. Soc. Am., 51, 123 (1961).
3. H. Davies, Proc. IEE, 101, 209 (1954).