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Volumn 128, Issue 8, 1981, Pages 1758-1762

Synthesis, Radiation Degradation, and Electron Beam Resist Behavior of Fluorine-Containing Vinyl Polymers

Author keywords

electron beam lithography; plasma etching; positive resists

Indexed keywords

LITHOGRAPHY;

EID: 0019606469     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2127726     Document Type: Article
Times cited : (28)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.