Low Energy Ion Beam Etching

Journal of the Electrochemical Society

Volumn 128, Issue 5, 1981, Pages 1077-1083

  Harper, J M E ^a   Cuomo, J J ^a   Leary, P A ^a   Summa, G M ^a   Kaufman, H R ^b   Bresnock, F J ^c  

^a IBM RESEARCH   (United States)

^b Veterinary Dentistry and Oral Surgery   (United States)

^c IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS - APPLICATIONS;

ETCHING;

EID: 0019565711     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2127554     Document Type: Article

References (7)

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5. G. C. Schwartz, L. B. Rothman, and T. J. Schopen, This Journal, 126, 464 (1979).
6. Y. Horiike, M. Shibagaki, and K. Kadono, Jpn. J. Appl. Phys., 18, 2309 (1979).
7. J. L. Mauer, J. S. Logan, L. B. Zielinski, and G. C. Schwartz, J. Vac. Sci. Technol, 15, 1734 (1978).