Steep Profile Resist Patterns through 1:1 Deep UV Projection Printing

IEEE Electron Device Letters

Volumn 2, Issue 4, 1981, Pages 90-91

  Matsuzawa, Toshiharu ^a   Tomioka, Hideki ^a  

^a Computer Development Laboratories Ltd ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0019551931     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/EDL.1981.25352     Document Type: Article

References (6)

1. T. Iwayanagi, et al., IEEE Trans. Electron. Devices, submitted for publication.
2. S. Iwamatsu, and K. Asanami, Solid State Technol., 23(5), p. 81, 1980.
3. T. Iwayanagi, T. Kohashi, and S. Nonogaki, J. Electrochem. Soc., in press.
4. B. J. Lin, J. Vac. Sci. Technol., 12, p. 1317, 1975.
5. C. A. Deckert and D. L. Ross, J. Electrochem. Soc., 127, p. 45C, 1980.
6. G. N. Taylor and T. M. Wolf, Polym. Eng. and Sci., 20, p. 1087, 1980.