MODIFICATION OF NIOBIUM FILM STRESSES BY LOW-ENERGY ION BOMBARDMENT DURING DEPOSITION.

Journal of vacuum science & technology

Volumn 20, Issue 3, 1981, Pages 349-354

  Cuomo, J J ^a   Harper, J M E ^a   Guarnieri, C R ^a   Yee, D S ^a   Attanasio, L J ^a   Angilello, J ^a   Wu, C T ^a   Hammond, R H ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS - APPLICATIONS; NIOBIUM COMPOUNDS; STRESSES; SUPERCONDUCTING MATERIALS - THIN FILMS;

NIOBIUM NITRIDE;

NIOBIUM AND ALLOYS;

EID: 0019536814     PISSN: 00225355     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.571462     Document Type: Conference Paper

References (17)