Sputtering of metals with 20 keV O 2+: Characteristic etch patterns and sputtered atom yields

Surface and Interface Analysis

Volumn 2, Issue 6, 1980, Pages 212-216

  Tsunoyama, K ^a   Suzuki, T ^a   Ohashi, Y ^a   Kishidaka, H ^a  

^a JFE STEEL CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SURFACES - MEASUREMENTS;

SPUTTERING;

EID: 0019227572     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.740020605     Document Type: Article

References (14)

1. Surface of Iron Bombarded with Argon and Oxygen Ions
2. Secondary−ion mass spectrometry and its use in depth profiling
3. Sputtering Yields for Low Energy He+-, Kr+-, and Xe+-Ion Bombardment