The Effect of Sensitizers on the Photodegradation of Poly (Methyl Methacrylate-co-3-Oximino-2-Butanone Methacrylate

Journal of the Electrochemical Society

Volumn 127, Issue 11, 1980, Pages 2514-2517

  Reichmanis, E ^a   Wilkins, C W ^a   Chandross, E A ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

deep u.v. resists; photodegradation; photoresists

Indexed keywords

PHOTORESISTS;

EID: 0019079194     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2129506     Document Type: Article

References (5)

1. (a) M. Feldman, D.L. White, E.A. Chandross, M.J. Bowden, and J. Appelbaum, “Proceedings of the Kodak Microelectronics Seminar,” Interface 75, p. 40, October 19-21, 1975; (b) M.J. Bowden and E.A. Chandross, Journal of the Electrochemical Society, 122, 1370 (1975); (c) B.J. Lin, J. Vac. Sci. Technol. 12, 1317 (1975); (d) B.J. Lin, IBM J. Res. Dev. 20, 213 (1975); (e) C.W. Wilkins, Jr. and L.E. Stillwagon, Private communication.
2. C.W. Wilkins, Jr. E. Reichmanis, and E.A. Chandross, Journal of the Electrochemical Society, 127, 2510 (1980).
3. M. Zander, Ber. Bunsenges. 72, 1161 (1968).
4. (a) Y. Nakane, T. Tsumori, and T. Mifune, Semicond. Internat. 45 (1979), (b) M. Tsuda. S. Oikawa, Y. Nakamura, H. Nakane, et al. Photogr Sci. Eng. 23, 290 (1979).
5. L.E. Stillwagon, E.M. Doerries, L.F. Thompson, and M.J. Bowden, “ACS Division of Organic Coatings and Plastics Preprints,” Vol. 37, No. 2, p. 38, Chicago (1977).