New preparation process for sputtered γ-Fe2O3 thin film disks

IEEE Transactions on Magnetics

Volumn 16, Issue 5, 1980, Pages 1114-1116

  Makino, K ^c   Ohta, S ^b   Hattori, S ^b  

^a Musashino Electrical Communication Lab   (Japan)

^b NTT CORPORATION   (Japan)

^c FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC MATERIALS - THIN FILMS; SPUTTERING;

DATA STORAGE, MAGNETIC;

EID: 0019065648     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/TMAG.1980.1060660     Document Type: Article

References (3)

1. N.Inagaki, S.Hattori, Y.Ishii, A.Terada and H.Katsuraki : IEEE Trans. Mag., vol. MAG-12, p785, 1976
2. S.Hattori, Y.Ishii, M.Shinohara and T.Nakagawa : IEEE Trans. Mag., vol. MAG-15, p1549, 1979
3. N.F.Borrelli, S.L.Chen and J.A.Murphy : IEEE Trans. Mag., vol. MAG-8, p648, 1972