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Volumn 27, Issue 5, 1980, Pages 931-938

Partially Coherent Imaging in Two Dimensions and the Theoretical Limits of Projection Printing in Microfabrication

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE PROCESSING;

EID: 0019018809     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1980.19959     Document Type: Article
Times cited : (80)

References (15)
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  • 2
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    • presented at the SPSE 31st Annual Conference. Washington. DC, May
    • Offner, “Wavelength and coherence effects on the performance of real optical projection systems,” presented at the SPSE 31st Annual Conference. Washington. DC, May 1978.
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    • Partial coherence in projection printing
    • R. S. Hershel, “Partial coherence in projection printing,” SPIE Proc., vol. 135, pp. 24–29, 1978.
    • (1978) SPIE Proc. , vol.135 , pp. 24-29
    • Hershel, R.S.1
  • 5
    • 0141766482 scopus 로고
    • Effects of small aberrations on the images of partially coherent objects
    • May
    • W. H. Steel, “Effects of small aberrations on the images of partially coherent objects”, J. Opt. Soc. Amer., vol. 47, pp. 405–413, May 1957.
    • (1957) J. Opt. Soc. Amer. , vol.47 , pp. 405-413
    • Steel, W.H.1
  • 6
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    • Theoretical calculations of images of straight edges in partially coherent illumination
    • B. M. Watrasiewicz, “Theoretical calculations of images of straight edges in partially coherent illumination,” Opt. Acta, vol. 12, pp. 391–400, 1965.
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  • 8
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    • Edge-ringing in partially coherent imaging
    • E. C. Kintner and R. M. Sillitto, “Edge-ringing in partially coherent imaging,” Opt. Acta, vol. 24, pp. 591–605, 1977.
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    • Kintner, E.C.1    Sillitto, R.M.2
  • 9
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    • Ambiguity of transfer function with partially coherent illumination
    • Oct.
    • R. E. Swing and J. R. Clay, “Ambiguity of transfer function with partially coherent illumination,” J. Opt. Soc. Amer., vol. 57, pp. 1180–1188. Oct. 1967.
    • (1967) J. Opt. Soc. Amer. , vol.57 , pp. 1180-1188
    • Swing, R.E.1    Clay, J.R.2
  • 11
    • 0016523047 scopus 로고
    • Reduction of photoresist standing-wave effects by post-exposure bake
    • E. J. Walker, “Reduction of photoresist standing-wave effects by post-exposure bake,” IEEE Trans. Electron Devices, vol. ED-22, p. 464, 1975.
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  • 13
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  • 14
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    • Deep UV lithography
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    • B. J. Lin, “Deep UV lithography,” J. Vac. Sci. Technol., vol. 12, PP. 1311–1320, Nov./Dec. 1975.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.