A model of electromigration failure under pulsed condition

Journal of Applied Physics

Volumn 51, Issue 1, 1980, Pages 508-512

  Schoen, J M ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS - METALLIC;

ELECTROMIGRATION;

INTEGRATED CIRCUITS;

EID: 0018812367     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.327354     Document Type: Article

References (8)