Megasonic cleaning: A new cleaning and drying system for use in semiconductor processing

Journal of Electronic Materials

Volumn 8, Issue 6, 1979, Pages 855-864

  Mayer, A ^a   Shwartzman, S ^a  

^a FCA UNESP   (Brazil)

Author keywords

Megasonic cleaning; semiconductor processing and cleaning; Ultrasonic cleaning

Indexed keywords

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0018541959     PISSN: 03615235     EISSN: 1543186X     Source Type: Journal    
DOI: 10.1007/BF02651188     Document Type: Article

References (2)