Sputtering of Si with keV Ar+ions. I. Measurement and monte carlo calculations of sputtering yield

Japanese Journal of Applied Physics

Volumn 18, Issue 9, 1979, Pages 1717-1725

  Kang, Suk Tai ^a   Shimizu, Ryuichi ^a   Okutani, Tsuyoshi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON - SPUTTERING;

SILICON AND ALLOYS;

EID: 0018520445     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.18.1717     Document Type: Article

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