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Journal of Applied Physics

Volumn 50, Issue 3, 1979, Pages 1519-1528

Energy and fluence dependence of the sputtering yield of silicon bombarded with argon and xenon

(2) Blank, P a Wittmaack, K a

a INSTITUTE OF EPIDEMIOLOGY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON;

EID: 0018443252 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.326140 Document Type: Article

Times cited : (87)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.