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Volumn 29, Issue 2, 1979, Pages 53-65

The effect of bakeout temperature on the electron and ion induced gas desorption coefficients of some technological materials

Author keywords

[No Author keywords available]

Indexed keywords

GASES - ADSORPTION; VACUUM TECHNOLOGY;

EID: 0018432606     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(79)80335-8     Document Type: Article
Times cited : (59)

References (14)
  • 5
    • 84914203583 scopus 로고    scopus 로고
    • D Blechschmidt, Private Communication in the form of an internal CERN Report, CERN-ISR-VA/77-65.
  • 8
    • 84914203581 scopus 로고    scopus 로고
    • Marie-Hélène Achard, Private Communication in the form of an internal CERN Report, CERN-ISR-VA/76-34.
  • 10
    • 84914203580 scopus 로고    scopus 로고
    • Marie-Hélène Achard and A G Mathewson, Private Communication in the form of an internal CERN Report, CERN-ISR-VA/76-33.
  • 14
    • 84914203577 scopus 로고    scopus 로고
    • W Unterlerchner, Private Communication in the form of an internal CERN Report, CERN-ISR-VA/77-27.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.