Optical properties of AlN epitaxial thin films in the vacuum ultraviolet region

Journal of Applied Physics

Volumn 50, Issue 2, 1979, Pages 896-898

  Yamashita, H ^a   Fukui, K ^a   Misawa, S ^b   Yoshida, S ^b  

^a Government Industrial Research Institute Ikeda   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS - THIN FILMS;

ALUMINUM NITRIDE;

FILMS;

EID: 0018430639     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.326007     Document Type: Article

References (15)