Theory and Direct Measurement of Boron Segregation in SiO2 during Dry, Near Dry, and Wet O2 Oxidation

Journal of the Electrochemical Society

Volumn 125, Issue 12, 1978, Pages 2050-2058

  Fair, Richard B ^a   Tsai, J C C ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

boron; diffusion; ion implantation; oxidation; segregation

Indexed keywords

SEMICONDUCTING SILICON; SILICON AND ALLOYS - OXIDATION;

SILICA;

EID: 0018051953     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2131361     Document Type: Article

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